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Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment.
This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Table des matières
1. Introduction.- 2. Reactors Without Transport.- 3. Mass Transport.- 4. Heat Transport.- 5. Chemistry for CVD.- 6. Gas Discharge Plasmas For CVD.- 7. CVD Films.- 8. CVD Reactors.
A propos de l'auteur
Daniel Dobkin has been involved in the development, manufacturing, and marketing of communications devices, components, and systems for over 28 years. He holds a BS from the California Institute of Technology, and MS and PhD degrees from Stanford University, all in Applied Physics. He is the author of three books and 30 technical publications, and holds 7 US patents as inventor or co-inventor. He has given numerous talks and classes on radio-frequency identification in the US and Asia. He specializes in physical-layer issues: radios and signal generation, antennas, and signal propagation.
Résumé
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment.
This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
