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Advances in Imaging and Electron Physics, Volume 224 highlights new advances in the field, with this new volume presenting interesting chapters on Measuring elastic deformation and orientation gradients by scanning electron microscopy - conventional, new and emerging methods, Development of an alternative global method with high angular resolution, Implementing the new global method, Numerical validation of the method and influence of optical distortions, and Applications of the method.
Inhaltsverzeichnis
Preface
Martin Hÿtch and Peter W. Hawkes
1. Measuring elastic strains and orientation gradients by scanning electron microscopy: Conventional and emerging methods
Clément Ernould, Benoît Beausir, Jean-Jacques Fundenberger, Vincent Taupin and Emmanuel Bouzy
2. Development of a global homography-based approach for high-angular resolution in the SEM
Clément Ernould, Benoît Beausir, Jean-Jacques Fundenberger, Vincent Taupin and Emmanuel Bouzy
3. Implementing the homography-based global approach
Clément Ernould, Benoît Beausir, Jean-Jacques Fundenberger, Vincent Taupin and Emmanuel Bouzy
4. Numerical validation and influence of optical distorsions on accuracy
Clément Ernould, Benoît Beausir, Jean-Jacques Fundenberger, Vincent Taupin and Emmanuel Bouzy
5. Applications of the method
Clément Ernould, Benoît Beausir, Jean-Jacques Fundenberger,Vincent Taupin and Emmanuel Bouzy
6. Spin wave physics: The nonlinear spin wave-electromagnetic interaction and implications for high frequency devices
Clifford M. Krowne
Über den Autor / die Autorin
Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
