Fr. 280.80

Silicon Surfaces & Formation Of

Inglese · Copertina rigida

Spedizione di solito entro 2 a 3 settimane (il titolo viene stampato sull'ordine)

Descrizione

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Silicon, the basic material for a multibillion-dollar industry, is the most widely researched and applied semiconductor, and its surfaces are the most thoroughly studied of all semiconductor surfaces. Silicon Surfaces and Formation of Interfaces may be used as an introduction to graduate-level physics and chemical physics. Moreover, it gives a specialized and comprehensive description of the most common faces of silicon crystals as well as their interaction with adsorbates and overlayers. This knowledge is presented in a systematic and easy-to-follow way. Discussion of each system is preceded by a brief overview which categorizes the features and physical mechanisms before the details are presented. The literature is easily available, and the references am numerous and organized in tables, allowing a search without the need to browse through the text.Though this volume focuses on a scientific understanding of physics on the atomistic and mesoscopic levels, it also highlights existing and potential links between basic research in surface science and applications in the silicon industry. It will be valuable to anyone writing a paper, thesis, or proposal in the field of silicon surfaces.

Dettagli sul prodotto

Autori Jarek Dabrowski, Jarek Dabrowski & Han Joachim Mussig, Hans-Joachim Mussig
Editore World Scientific
 
Lingue Inglese
Formato Copertina rigida
Pubblicazione 25.05.2000
 
EAN 9789810232863
ISBN 978-981-02-3286-3
Pagine 576
Dimensioni 157 mm x 235 mm x 35 mm
Peso 974 g
Categorie Scienze naturali, medicina, informatica, tecnica > Fisica, astronomia > Altro

Anorganische Chemie, Wissenschaftliche Ausstattung, Experimente und Techniken, Chemische Physik

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