Fr. 355.00

Glow-Discharge Hydrogenated Amorphous Silicon

English · Hardback

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Description

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A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin

Product details

Authors K Tanaka, K. Tanaka
Publisher Springer Netherlands
 
Languages English
Product format Hardback
Released 29.06.2009
 
EAN 9780792303091
ISBN 978-0-7923-0309-1
No. of pages 277
Dimensions 156 mm x 234 mm x 19 mm
Weight 590 g
Illustrations X, 277 p.
Series Advances in Solid State Technology
Advances in Solid State Technology
Subject Natural sciences, medicine, IT, technology > Physics, astronomy > Atomic physics, nuclear physics

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