Fr. 85.00

Maurice H. Francombe, Maurice H. (Georgia State University Francombe, John Vossen, John L. Vossen

Advances in Research and Development - Plasma Sources for Thin Film Deposition and Etching

English · Hardback

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Description

List of contents

M.A. Lieberman and R.A. Gottscho, Design of High- Density Plasma Sources for Materials Processing. O.A. Popov, Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films. S.L. Rohde, Unbalanced Magnetron Sputtering. C. Steinbruchel, The Formation of Particles in Thin-Film Processing Plasmas. References. Author Index. Subject Index.

Summary

Includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalanced magnetron sputtering, and particle formation in thin film processing plasma.

Product details

Assisted by	Maurice H. Francombe (Editor), Maurice H. (Georgia State University Francombe (Editor), John Vossen (Editor), John L. Vossen (Editor)
Publisher	ELSEVIER SCIENCE BV

Languages	English
Product format	Hardback
Released	01.01.2008

EAN	9780125330183
ISBN	978-0-12-533018-3
No. of pages	328
Series	Thin Films and Nanostructures Thin Films and Nanostructures Physics of Thin Films
Subject	Natural sciences, medicine, IT, technology > Chemistry > Miscellaneous

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