Read more
Zusatztext Praise for the First Edition"?The editors have done an excellent job of gathering the knowledge of a number of world experts and blending it into a harmonious whole which will serve as a reference for some time to come! even in this fast-moving field."-International Journal of Electrical Engineering Education Klappentext Like the bestselling original! this second edition of Microlithography is a self-contained text detailing both elementary and advanced aspects of submicron microlithography! offering a balanced treatment of theoretical and operating practices. Reflecting recently developed technologies! this edition includes coverage of immersion lithography! extreme ultraviolet (EUV) lithography! imprint lithography! photoresists for 193nm and immersion lithography! and scatterometry. The authors cover mechanical systems! optics! excimer laser light sources! and alignment techniques and analysis! as well as resist chemistry! processing! multilayer lithography! plasma and reactive ion etching! and metrology. Zusammenfassung This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems. Inhaltsverzeichnis EXPOSURE SYSTEM. System Overview of Optical Steppers and Scanners. Optical Lithography Modeling. Optics for Photolithography. Excimer Laser for Advanced Microlithography. Alignment and Overlay. Electron Beam Lithography System. X-Ray Lithography. EUV Lithography. Imprint Lithography. RESISTS AND PROCESSING. Chemistry of Photoresist Materials. Resist Processing. Multilayer Resist Technology. Dry Etching of Photoresists. METROLOGY AND NANOLITHOGRAPHY. Critical-Dimensional Metrology for Integrated-Circuit Technology. Electron Beam Nanolithography. Index....
