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Klappentext Ein umfassender Führer durch physikalische Grundlagen und chemische Aspekte der Halbleiterverarbeitung, der eine Fülle von Themen von der chemischen Reaktion bis zur Mikrostrukturierung abdeckt. Geboten wird auch eine einzigartige Sammlung von produktionsorientierten Aspekten. (02/98) Zusammenfassung A two-volume comprehensive guide to both the fundamental physics and chemistry of semiconductor processing! this text covers a broad range of topics ranging from chemical processes through to the microstructuring of semiconductors. Inhaltsverzeichnis Volume 1Electrochemical and Photochemical Properties of SemiconductorsS. MorrisonChemical and Electrochemical Etching of SemiconductorsJ. Kelly and D. VanmaekelberghPhotoetching of III-V Semiconductors: Basic Photoelectrochemical PrinciplesW. Plieth and S. WetzensteinInfluence of Photoelectrochemical Etching on Electronic Properties of Semiconductor SurfacesR. TenneSurface Conditioning of Silicon by Photoelectrochemical EtchingC. Levy-ClementElectrochemical Conditioning of Silicon: Surface Analyses and Electronic ImplicationsH. Lewerenz and H. JungblutThe Formation of Porous SiliconD. RileyIndexVolume 2Anisotrophy and the Micromachining of SiliconA. Campbell, et al.Etch StopsS. CollinsPhotonic Integrated Circuits, Technology and ConceptsR. MatzMonolithically Integrated Sensors for Mechanical Quantities in Standard CMOS ProcessingH. Offereins, et al.Silicon on InsulatorsC. Harendt and G. RoosIntegrated Sensors and ActuatorsN. NajaftSmart SensorsN. Najaft and J. MoyneAnodic Oxidation of Silicon as a Low-Temperature Passivation TechniqueG. MendeMicromachined Optoelectronic Structures and DevicesP. DeimelWet and Dry Etching: A Comparison in the Context of Solid State Electronics ApplicationsK. BachmannIndex
