Fr. 225.00

Maurice H. Francombe, John Vossen, John L. Vossen

Advances in Research and Development - Modeling of Film Deposition for Microelectronic Applications

English · Hardback

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Description

Zusammenfassung The progress in device technologies are surveyed in this volume. Included are Si/ (Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, and III-V quantum-well detector structures operated in the heterodyne mode.

Product details

Assisted by	Maurice H. Francombe (Editor), John Vossen (Editor), John L. Vossen (Editor)
Publisher	ELSEVIER SCIENCE BV

Languages	English
Product format	Hardback
Released	14.11.1997

EAN	9780125330237
ISBN	978-0-12-533023-7
No. of pages	311
Series	Thin Films Vol. 23 Thin Films
Subject	Natural sciences, medicine, IT, technology > Physics, astronomy > Atomic physics, nuclear physics

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