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Informationen zum Autor John C. Vickerman BSc in Chemistry (Edinburgh), Ph.D. in Surface Chemistry (Bristol), DSc (Bristol). Predoctoral fellowships at the Universities of Perugia and Rome, postdoctoral fellowships at the University of Bristol and the Technical University of Eindhoven. Sabbatical study periods at the University of Munich, the Free University of Berlin and Pennsylvania State University. Dr Ian Gilmore , Surface and Nano-Analysis, National Physical Laboratory, Teddington, UK Ian is a Principal Research Scientist in the Surface and Nano-Analysis Research team and joined NPL in 1991. His research has a focus on the analysis of complex molecules at surfaces. Recent research has led to the development of a novel new variant of static static SIMS called gentle-SIMS or G-SIMS, He received a degree in Physics from the University of Manchester in 1991 and a PhD from the University of Loughborough in 2000. Ian is a Fellow of the Institute of Physics a member of the EPSRC College and a member of the American Vacuum Society. Klappentext Die Theorie und Praxis der Oberflächenanalyse wird von Experten mehrerer Fachgebiete erläutert. Dadurch wird der Leser in die Lage versetzt, Ergebnisse und Datenreihen zu verstehen und umzusetzen. Zusammenfassung This completely updated and revised second edition of Surface Analysis: The Principal Techniques, deals with the characterisation and understanding of the outer layers of substrates, how they react, look and function which are all of interest to surface scientists. Inhaltsverzeichnis List of Contributors xv Preface xvii 1 Introduction 1 John C. Vickerman 1.1 How do we Define the Surface? 1 1.2 How Many Atoms in a Surface? 2 1.3 Information Required 3 1.4 Surface Sensitivity 5 1.5 Radiation Effects - Surface Damage 7 1.6 Complexity of the Data 8 2 Auger Electron Spectroscopy 9 Hans Jörg Mathieu 2.1 Introduction 9 2.2 Principle of the Auger Process 10 2.2.1 Kinetic Energies of Auger Peaks 11 2.2.2 Ionization Cross-Section 15 2.2.3 Comparison of Auger and Photon Emission 16 2.2.4 Electron Backscattering 17 2.2.5 Escape Depth 18 2.2.6 Chemical Shifts 19 2.3 Instrumentation 21 2.3.1 Electron Sources 22 2.3.2 Spectrometers 24 2.3.3 Modes of Acquisition 24 2.3.4 Detection Limits 29 2.3.5 Instrument Calibration 30 2.4 Quantitative Analysis 31 2.5 Depth Profile Analysis 33 2.5.1 Thin Film Calibration Standard 34 2.5.2 Depth Resolution 36 2.5.3 Sputter Rates 37 2.5.4 Preferential Sputtering 40 2.5.5 ¿-Correction 41 2.5.6 Chemical Shifts in AES Profiles 42 2.6 Summary 43 References 44 Problems 45 3 Electron Spectroscopy for Chemical Analysis 47 Buddy D. Ratner and David G. Castner 3.1 Overview 47 3.1.1 The Basic ESCA Experiment 48 3.1.2 A History of the Photoelectric Effect and ESCA 48 3.1.3 Information Provided by ESCA 49 3.2 X-ray Interaction withMatter, the Photoelectron Effect and Photoemission from Solids 50 3.3 Binding Energy and the Chemical Shift 52 3.3.1 Koopmans' Theorem 53 3.3.2 Initial State Effects 53 3.3.3 Final State Effects 57 3.3.4 Binding Energy Referencing 58 3.3.5 Charge Compensation in Insulators 60 3.3.6 Peak Widths 61 3.3.7 Peak Fitting 62 3.4 Inelastic Mean Free Path and Sampling Depth 63 3.5 Quantification 67 3.5.1 Quantification Methods 68 3.5.2 Quantification Standards 70 3.5.3 Quantification Example 71 3.6 Spectral Features 73 3.7 Instrumentation 80 3.7.1 Vacuum Systems for ESCA Experiments 80 3.7.2 X-ray Sources 82 3.7.3 Analyzers 84<...
