Spacer Engineered Finfet Architectures - High-Performance Digital Circuit Applications

Summary

This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.

Product details

• Authors: Sudeb Dasgupta, Sudeb (Indian Institute of Technology Dasgupta, Sudeb Kaushik Dasgupta, Brajesh Kumar Kaushik, Kaushik Brajesh Kumar, Pankaj Kumar Pal
• Publisher: Taylor & Francis Ltd.
• Languages: English
• Product format: Hardback
• Released: 06.06.2017
• EAN: 9781498783590
• ISBN: 978-1-4987-8359-0
• No. of pages: 154
• Subjects: Natural sciences, medicine, IT, technology > Technology > General, dictionaries; TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS, TECHNOLOGY & ENGINEERING / Electronics / Circuits / General, TECHNOLOGY & ENGINEERING / Electrical, TECHNOLOGY & ENGINEERING / Electronics / Microelectronics, Electrical Engineering, environmental science, engineering & technology, Nanotechnology, Environmental science, engineering and technology, Electronics: circuits and components, Circuits & components