Modern GAAS Processing Methods

This book gives professional microwave and semiconductor IC design and process engineers the information they need to apply GaAs processing techniques for improved reliability.

List of contents

GaAs material and crystal properties; GaAs devices; general process techniques; cleaning and cleanliness; wet etching; photolithography; nonoptical lithography; plasma processing equipment and plasma-assisted deposition; dry etching; plasma, RIE, RIBE, ion milling; specific process types; device isolation; ohmic contacts; schottky barriers and gate formation; first-level metal, dielectric formation, second-level metal; capacitors, inductors, and resistors.

Product details

• Authors: Ralph E. Williams
• Publisher: Artech House Publishers
• Languages: English
• Product format: Hardback
• Released: 01.06.1990
• EAN: 9780890063439
• ISBN: 978-0-89006-343-9
• No. of pages: 460
• Dimensions: 158 mm x 235 mm x 35 mm
• Weight: 794 g
• Series: Artech House Microwave Library; Artech House Microwave Library
• Subject: Natural sciences, medicine, IT, technology > Technology > Electronics, electrical engineering, communications engineering