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This is the first book to provide an in-depth presentation of photosensitive polyimides for electronic and photonic applications. The authors are leading specialists in this field from Japan, Europe and the U.S.
From the Preface
Aromatic polyimides were developed originally as thermostable flexible polymer films for space applications. Now polyimides have found widespread use in the manufacture of electronic devices and have been employed in increasingly diverse areas of electronics and information technology. In addition to their excellent thermal stability and high processability, a wide range of chemical and physical properties provided by molecular engineering makes polyimides highly versatile in the electronics and information industries.
Lithography of polyimides is an inevitable process in using polyimides for microelectronic fields, and hence increasing research has been devoted to developing photosensitive polyimides, which make it unnecessary to use photoresists for patterning polyimides and diminishing markedly the number of steps in fabrication of various electronic devices.
In addition, the development of technology of photosensitive polyimides is expected to play a great role in manufacturing photonic devices in the near future, when the design and control of hyper fine structures . . . including higher thermal stability and better processability would be essential.
List of contents
PrefaceIntroduction to Photopolymers and Microelectronics Introduction Photosensitive Polymers Polymers for Microelectronics ReferencesApplications of Polyimides in ElectronicsIntroduction Commercially Available Photosensitive Polyimides Performance of Commercial Photosensitive Polyimides Applications Outlook ReferencesThermal and Mechanical Properties of Polyimides and Control of High-Order StructuresIntroduction Thermal and Mechanical Properties of Aromatic Polyimides Control of High-Order Structures of Aromatic Polyimides ReferencesElectronic Configuration of Polyimides and Their Photophysical ProcessesIntroduction Color of Polyimide Films Emission of Polyimide Films Photophysical Processes in Polyimide Model Compounds Photochemistry of Polyimide Model Compounds Other Related Emission Behavior of Imide Compounds and Their Analogue Photoconductivity of Polyimide Films ReferencesDesign of Photosensitive Polyimide Precursor SystemsIntroduction Structure and Reaction of Photosensitive Polyimide Precursors Properties of Polyimides Formed from Photosensitive Polyimide Precursors Conclusion ReferencesIntrinsically Photosensitive PolyimidesIntroduction Structure and Reaction of Intrinsically Photosensitive Polyimides Photoreactivity Mechanism and Molecular Design for Improvement of Photosensitive Polyimides References Photosensitive Polyimides Based on Chemical Amplification MechanismIntroduction Amplification Process for Photosensitive Materials Chemical Amplification Synthesis of Polyimides Characteristics of Protected Polyimides 6F-t-BOC and 6F-THP Lithographic Performance of Protected Polyimides Acidolytic Deprotection Rate in Film Matrices Photochemical Reaction of PAG in Solid Films Properties of 6F-t-BOC and 6F-THP <
About the author
Yamashita, Takashi
Summary
This is the first book to provide an in-depth presentation of photosensitive polyimides for electronic and photonic applications
