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This book provides an overview of sputtered thin films and demystifies the concept of fractal theory in analysis of sputtered thin films. It simplifies the use of fractal tools in studying the growth and properties of thin films during sputtering processes.
List of contents
Part 1. Theory. 1. Thin Film Growth, Structure, and Properties. 2. Fractal Theory. 3. Methods of Fractal Measurements.
Part 2. Typical Studies of Fractal Descriptions of Sputtered Films. 4. Fractal Characterization of Hillocks and Porosity in Sputtered Films. 5. Fractal Analyses of Roughness of Sputtered Films. 6. Multifractal Characterization of Structure Evolution with Sputtering Parameters of Thin Films. 7. Fractal Prediction of Film Growth and Properties.
About the author
Fredrick Madaraka Mwema received his PhD in Mechanical Engineering from the University of Johannesburg, South Africa, with a concentration on Advanced Manufacturing and Materials Processing. Esther Titilayo Akinlabi is Professor in the Department of Mechanical Engineering Science, University of Johannesburg. South Africa. From 2017 to 2018 she served as Vice Dean, Teaching and Learning, Faculty of Engineering and the Built Environment, University of Johannesburg. Her expertise and skills include Laser based Additive Manufacturing, Welding processes: Friction Stir Welding and Processing, Metal Matrix and Fibre Crimp Composites, Characterizations and Mechanical testing of Metallic and Non-metallic Materials, and Design and Process Optimization of Energy, Mechanical and Manufacturing systems. Prof. Akinlabi has consulted for South Africa Agency for Science and Technology Advancement (SAASTA), Vikinduku Engineering and Projects, and Siemens South Africa. Oluseyi Philip Oladijo is Senior Lecturer at Botswana International University of Science & Technology. He received his PhD from University of the Witwatersrand Johannesburg, South Africa.
Summary
This book provides an overview of sputtered thin films and demystifies the concept of fractal theory in analysis of sputtered thin films. It simplifies the use of fractal tools in studying the growth and properties of thin films during sputtering processes.
