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Informationen zum Autor D. Keith Bowen, Brian K. Tanner Zusammenfassung Emphasizes on practical metrology, with real world examples from the semiconductor and magnetics industries. This book discusses the techniques, theory, and applications of X-ray metrology in semiconductors and other advanced thin films. It covers the essential metrological questions of precision and repeatability, absolute accuracy and spot size. Inhaltsverzeichnis THE APPLICATIONSIntroduction Scope of X-Ray Metrology (XRM) Specular X-Ray Reflectivity (XRR) Diffuse Scatter X-Ray Diffraction High-Resolution X-Ray Diffraction Diffraction Imaging and Defect Mapping X-Ray Fluorescence SummaryThickness Metrology Introduction Dielectrics and Metals Multiple Layers Epitaxial Layers SummaryComposition and Phase Metrology Introduction Amorphous Films Polycrystalline Films Wafers and Epitaxial Films Summary ReferencesStrain and Stress Metrology Introduction Strain and Stress in Polycrystalline Layers Relaxation of Epitaxial Layers Thin Strained Silicon Layers Whole Wafer Defect Metrology Summary ReferencesMosaic Metrology Grain Size Measurement Mosaic Structure in Substrate Wafers Mosaic Structure in Epilayers Summary ReferencesInterface Roughness Metrology Interface Width and Roughness Distinction of Roughness and Grading Roughness Determination in Semiconductors Roughness Determination in Metallic Films Roughness Determination in Dielectrics Summary ReferencesPorosity Metrology Determination of Porosity Determination of Pore Size and Distribution Pores in Single Crystals Summary ReferencesTHE SCIENCESpecular X-Ray Reflectivity Principles Specular Reflectivity from a Single Ideal Interface Specular Reflectivity from a Single Graded or Rough Interface Specular Reflectivity from a Single Thin Film on a Substrate Specular Reflectivity from Multiple Layers on a Substrate Summary ReferencesX-Ray Diffuse Scattering Origin of Diffuse Scatter from Surfaces and Interfaces The Born Approximation The Distorted-Wave Born Approximation Effect of Interface Parameters on Diffuse Scatter Multiple-Layer Structures Diffuse Scatter Represented in Reciprocal Space Summary ReferencesTheory of XRD on Polycrystals Introduction Kinematical Theory of X-Ray Diffraction Determination of Strain Determination of Grain Size Texture Reciprocal Space Geometry Summary ReferencesHigh-Resolution XRD on Single Crystals Introduction Dynamical Theory of X-Ray Diffraction The Determination of Epilayer Parameters High-Resolution Diffraction in Real and Reciprocal Space Summary ReferencesDiffraction Imaging and Defect Mapping Introduction Contrast in X-Ray Diffraction Imaging (XRDI) Spatial Resolution in XRDI X-Ray Defect Imaging Methods Example Applications Summary ReferencesTHE TECHNOLOGYModeling and Analysis What Has Been Measured? Direct Methods Data-Fitting Methods The Differential Evolution Method Requirements for Automated Analysis Summary ReferencesInstrumentation Introduction X-Ray Sources X-Ray Optics Mechanical Technology Detectors Practical Realizations Summary ReferencesAccuracy and Precision of X-Ray Metrology Introduction Design of X-Ray Metrology Repeatability and Reproducibility Accuracy and Trueness Repeatability and Throughput Absolute Tool Matching Specimen-Induced Limitations Summary ReferencesINDEX ...
