Design for Manufacturability with Advanced Lithography

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

List of contents

Introduction.- Layout Decomposition for Triple Patterning.- Layout Decomposition for Other Patterning Techniques.- Standard Cell Compliance and Placement Co-Optimization.- Design for Manufacturability with E-Beam Lithography.- Conclusions and Future Works.-

Summary

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

Product details

• Authors: David Z Pan, David Z. Pan, Be Yu, Bei Yu
• Publisher: Springer, Berlin
• Languages: English
• Product format: Paperback / Softback
• Released: 01.01.2016
• EAN: 9783319373935
• ISBN: 978-3-31-937393-5
• No. of pages: 164
• Dimensions: 155 mm x 9 mm x 235 mm
• Weight: 278 g
• Illustrations: XI, 164 p.
• Subjects: Natural sciences, medicine, IT, technology > Technology > Electronics, electrical engineering, communications engineering; B, Microprocessors, engineering, Circuits and Systems, Electronics, Electronics and Microelectronics, Instrumentation, Electronics engineering, Electronic Circuits and Systems, Processor Architectures, Computer architecture and logic design, Computer Architecture