Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.
Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.

List of contents

Part One: Physics and chemistry of block copolymer (BCP) materials
1: Physics of block copolymers from bulk to thin films
2: RAFT synthesis of block copolymers and their self-assembly properties
3: Thermal and solvent annealing of block copolymer films
4: Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly
Part Two: Templates and patterning for directed self-assembly
5: Directed self-oriented self-assembly of block copolymers using topographical surfaces
6: Directed self-oriented self-assembly of block copolymers using chemically modified surfaces
7: X-ray characterization of directed self-assembly block copolymers
8: Self-assembly of block copolymers by graphoepitaxy
Part Three: Application of directed self-assembly in nanomanufacturing
9: The inverse directed self-assembly problem
10: Directed self-assembly guiding template design for contact hole patterning
11: Modelling and analysis of large-scale, template self-assembly manufacturing techniques

Product details

• Authors: Roel Gronheid, Roel (Imec Gronheid, Roel Nealey Gronheid
• Assisted by: Roel Gronheid (Editor), Gronheid Roel (Editor), Paul Nealey (Editor), Nealey Paul (Editor)
• Publisher: ELSEVIER SCIENCE BV
• Languages: English
• Product format: Hardback
• Released: 31.08.2015
• EAN: 9780081002506
• ISBN: 978-0-08-100250-6
• No. of pages: 328
• Series: Woodhead Publishing Series in Electronic and Optical Materials; Woodhead Publishing Series in Electronic and Optical Materials; Woodhead Publishing Series in; Woodhead Publishing Electronic
• Subjects: Natural sciences, medicine, IT, technology > Physics, astronomy > Atomic physics, nuclear physics; TECHNOLOGY & ENGINEERING / Textiles & Polymers, TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS, Nanotechnology, Materials science, TECHNOLOGY & ENGINEERING / Materials Science / General, Engineering applications of polymers and composites, Plastics & polymers technology, Plastics and polymers