Plasma Etching - Fundamentals and Applications

Informationen zum Autor Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: [phone] Klappentext This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process. Zusammenfassung The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. Inhaltsverzeichnis 1: Introduction 2: RF discharges 3: Physical basis of plasma etching process 4: Diagnostics of plasma particles and potentials 5: Technology of reactive ion etching 6: Magnetic field coupled etchers 7: ECR plasma etchers 8: Future propects Index

Product details

• Authors: M. Sugawara, Minoru Sugawara
• Publisher: Oxford University Press
• Languages: English
• Product format: Hardback
• Released: 01.05.1998
• EAN: 9780198562870
• ISBN: 978-0-19-856287-0
• No. of pages: 356
• Series: Series on Semiconductor Science and Technology; Semiconductor Science and Tech; Series on Semiconductor Science and Technology; Semiconductor Science and Tech
• Subject: Natural sciences, medicine, IT, technology > Technology > Mechanical engineering, production engineering