Plasma Processes for Semiconductor Fabrication - Engineerin

Klappentext An up-to-date description of plasma etching and deposition in semiconductor fabrication. Zusammenfassung Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes! and shows how they can be accurately modelled. Suitable as a graduate-level textbook! and will also be a useful reference for practising engineers in the semiconductor industry. Inhaltsverzeichnis 1. Introduction; 2. Plasma processes and semiconductors; 3. Plasma electromagnetics and circuit models; 4. Plasma models; 5. Plasma chemistry; 6. Transport at long mean free path; 7. Evolution of the trench; 8. Physical description of the plasma; 9. Going further; 10. Glossary.

Product details

• Authors: W N G Hitchon, W. N. G. Hitchon, W.n.g. Hitchon
• Assisted by: Haroon Ahmad (Editor), Michael Pepper (Editor)
• Publisher: Cambridge University Press ELT
• Languages: English
• Product format: Paperback / Softback
• Released: 29.09.2005
• EAN: 9780521018005
• ISBN: 978-0-521-01800-5
• No. of pages: 232
• Series: Cambridge Studies in Semicondu
• Subject: Natural sciences, medicine, IT, technology > Technology > Electronics, electrical engineering, communications engineering