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Informationen zum Autor Gertjan Koster is Associate Professor and Guus Rijnders is Chairman of Inorganic Materials Science at the University of Twente! The Netherlands. Klappentext Recent advances in techniques to characterize thin films in-situ during deposition could lead to an improved understanding of deposition processes and to better! faster! diagnosis of issues with the deposition process. This book provides a comprehensive review of this increasingly important topic! focusing on the techniques and concepts. Zusammenfassung Part one reviews electron diffraction techniques! including the methodology for taking observations and measurements. Part two covers photoemission techniques; the principles and instrumentation. Part three contains alternative in-situ characterisation techniques and the trend for combining different techniques. Inhaltsverzeichnis Part 1 Electron diffraction techniques for studying thin film growth in situ: Reflection high-energy electron diffraction (RHEED) and low energy electron diffraction (LEED) for in situ characterisation of thin film growth; Inelastic scattering techniques for in situ characterisation of thin film growth: backscatter Kikuchi diffraction. Part 2 Photoemission techniques for studying thin film growth in situ: Ultraviolet photoemission spectroscopy (UPS) for in situ characterisation of thin film growth; X-ray photoelectron spectroscopy (XPS) for in situ characterisation of thin film growth; In situ spectroscopic ellipsometry (SP) for characterization of thin film growth. Part 3 Alternative in situ characterization techniques: In situ ion beam surface characterization of thin multicomponent films; Spectroscopies combined with (RHEED) for real time in situ surface monitoring of thin film growth; In situ deposition vapor monitoring; Real-time studies of epitaxial film growth using surface x-ray diffraction (SXRD).
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Chapter 1: Reflection high-energy electron diffraction (RHEED) for in situ characterization of thin film growth
Abstract:
1.1 Reflection high-energy electron diffraction (RHEED) and pulsed laser deposition (PLD)
1.2 Basic principles of RHEED
1.3 Analysis of typical RHEED patterns: the influence of surface disorder
1.4 Crystal growth: kinetics vs thermodynamics
1.5 Variations of the specular intensity during deposition
1.6 Kinetical growth modes and the intensity response in RHEED
1.7 RHEED intensity variations and Monte Carlo simulations
1.8 Conclusions
1.9 Acknowledgements
Chapter 2: Inelastic scattering techniques for in situ characterization of thin film growth: backscatter Kikuchi diffraction
Abstract:
2.1 Introduction
2.2 Kikuchi patterns
2.3 Kikuchi lines in reflection high-energy electron diffraction (RHEED) images
2.4 Dual-screen RHEED and Kikuchi pattern collection
2.5 Lattice parameter determination
2.6 Epitaxial film strain determination
2.7 Kinematic and dynamic scattering
2.8 Epitaxial film structure determination
2.9 Conclusion
Chapter 3: Ultraviolet photoemission spectroscopy (UPS) for in situ characterization of thin film growth
Abstract:
3.1 Introduction
3.2 Principles of ultraviolet photoemission spectroscopy (UPS)
3.3 Applications of UPS to thin film systems
3.4 Future trends
Chapter 4: X-ray photoelectron spectroscopy (XPS) for in situ characterization of thin film growth
Abstract:
4.1 Introduction
4.2 In situ monitoring of thin film growth
4.3 Measuring the reaction of thin films with gases using ambient pressure X-ray photoelectron spectroscopy (XPS)
4.4 In situ measurements of buried interfaces using high kinetic energy XPS (HAXPES)
4.5 Conclusions
4.6 Acknowledgments
Chapter 5: In situ spectroscopic ellipsometry (SE) for characterization of thin film growth
Abstract:
5.1 Introduction
5.2 Principles of ellipsometry
5.3 In situ spectroscopic ellipsometry (SE) characterization
5.4 In situ considerations
5.5 Further in situ SE examples
5.6 Conclusions
5.8 Acknowledgments
Chapter 6: In situ ion beam surface characterization of thin multicomponent films
Abstract:
6.1 Introduction
6.2 Background to ion backscattering spectrometry and time-of-flight (TOF) ion scattering and recoil methods
6.3 Experimental set-ups
6.4 Studies of film growth processes relevant to multicomponent oxides
6.5 Conclusions
6.6 Acknowledgments
Chapter 7: Spectroscopies combined with reflection high-energy electron diffraction (RHEED) for real-time in situ surface monitoring of thin film growth
Abstract:
7.1 Introduction
7.2 Overview of processes and excitations by primary electrons in the surface
7.3 Recombination and emission processes
7.4 Descriptions and results of in situ spectroscopies combined with reflection high-energy electron diffractio (RHEED)
7.5 Conclusion and future trends
Chapter 8: In situ deposition vapor monitoring
Abstract:
8.1 Introduction
8.2 Overview of vapor flux monitoring
8.3 Quartz crystal microbalance (QCM)
8.4 Vapor ionization techniques
8.5 Optical absorption spectroscopy techniques
8.6 Summary of techniques and resources
8.7 Case studies
8.8 Conclusions
8.9 Acknowledgments
Chapter 9: Real-time studies of epitaxial film growth using surface X-ray diffraction (SXRD)
Abstract:
9.1 Introduction
9.2 Growth kinetics studies of pulsed laser deposition (PLD) using surface X-ray diffraction (SXRD)
9.3 Real-time SXRD in SrTiO3 PLD: an experimental case study
About the author
Gertjan Koster is a Professor at the University of Twente in the Netherlands. He is also a visiting professor at the Joseph Stephan Institute in Slovenia. His current research focuses on the growth and study of artificial materials, the physics of reduced scale (nanoscale) materials, metal–insulator transitions, and in situ spectroscopic characterization.Guus Rijnders is a Professor and Chairman of Inorganic Materials Science, University of Twente, Enschede, Netherlands. His research currently focuses on the integration of functional and smart materials with electronic and microelectromechanical systems (MEMS).
