Fr. 188.00

Theory and Application of Laser Chemical Vapor Deposition

English · Paperback / Softback

Shipping usually within 1 to 2 weeks (title will be printed to order)

Description

Read more

In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.

List of contents

1. Introduction.- 2. Pyrolytic LCVD.- 3. Photolytic LCVD.- 4. Pyrolytic LCVD Modeling.- 5. Photolytic LCVD Modeling.- A.1. Definitions of Energy Density, Irradiance, and Intensity.- A.2. Thermal Stress Analysis.- A.3. Volumetric Absorption Rate.- Nomenclature.- References.

Product details

Authors Aravinda Kar, Mazumder, J Mazumder, J. Mazumder
Publisher Springer, Berlin
 
Languages English
Product format Paperback / Softback
Released 14.11.2013
 
EAN 9781489914323
ISBN 978-1-4899-1432-3
No. of pages 396
Dimensions 152 mm x 22 mm x 229 mm
Weight 589 g
Illustrations XII, 396 p.
Series Lasers, Photonics, and Electro-Optics
Lasers, Photonics, and Electro-Optics
Subject Natural sciences, medicine, IT, technology > Technology > Electronics, electrical engineering, communications engineering

Customer reviews

No reviews have been written for this item yet. Write the first review and be helpful to other users when they decide on a purchase.

Write a review

Thumbs up or thumbs down? Write your own review.

For messages to CeDe.ch please use the contact form.

The input fields marked * are obligatory

By submitting this form you agree to our data privacy statement.