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Informationen zum Autor Uzodinma Okoroanyanwu is the author of Chemistry and Lithography, published by Wiley. Klappentext Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry. Zusammenfassung This book will be of interest to all involved in the semiconductor industry. Offering a complete overview of the topic of lithography it will be of interest to practitioners, researchers and students. Chemists, Electrical Engineers, chip designers and manufacturers. Conferences: OSA, ISSCC, ISCS, EMC, ICASSP. Inhaltsverzeichnis Preface. Acronyms and Abbreviations. Part I. Origins, Inventions, and the Evolution of Lithography. 1. Introduction to Lithography. 2. Invention of Lithography and Photolithography. 2.1 Introduction. 2.2 Invention of Lithography. 2.3 Invention of Photolithography. 2.4 Pioneers of Photography. 3. Optical and Chemical Origins of Lithography. 3.1 Introduction. 3.2 Key Developments that Enabled the Invention and Development of Lithography. 4. Evolution and Lithography. 4.1 Introduction. 4.2 Offset Lithography. 4.3 The Printed Circuit Board and the Development of the Electronics Industry. 4.4 The Transistor and Microelectronics Revolution. 4.5 The Integrated Circuit. 4.6 Other Notable Developments in Transistor Technology. 4.7 Overall Device Technology Trends. 4.8 Semiconductor Lithography. 4.9 X-ray Lithography. 4.10 Electron-Beam Lithography. 4.11 Ion-Beam Lithography. 4.12 Extreme Ultraviolet Lithography. 4.13 Soft Lithography. 4.14 Proximal Probe Lithography. 4.15 Atom Lithography. 4.16 Stereolithography. 4.17 Molecular Self-Assembly Lithography. Part II. Lithographic Chemicals . 5. Lithographic Chemicals. 5.1 Introduction. 5.2 Resists. 5.3 Antireflection Coatings. 5.4 Resist Developers and Rinses. 5.5 Resist Strippers and Cleaners. 5.6 Offset Lithographic Inks and Fountain Solutions. 6. Negative Resists. 6.1 Introduction. 6.2 Resins. 6.3 Types and Negative Resists. 6.4 General Considerations on the Chemistry of Cross-Linking. 6.5 Negative Resists Arising from Polymerization of Monomers. 6.6 General Considerations on the Chemistry of Photoinitiated. 6.7 General Considerations of Photoinitiated Condensation Polymerization. 6.8 General Considerations on the Photoinitiated Cationic Polymerization Employed in Negative Resist Systems. 6.9 Practical Negative Resist Compositions Arising from Photopolymerization of Monomers in the Presence of Polyfunctional Components. 6.19 Lithographic Applications of Photopolymerization Nega...
