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Informationen zum Autor Dr. van der Heide currently serves as the Group Lead of the Surface Analysis department at Samsung Austin, Texas which houses state-of-the-art XPS, AES, SIMS and AFM instrumentation. Former Assistant Professor, Chemistry Department, University of Houston, TX. Klappentext This book introduces readers interested in the field of X-ray Photoelectron Spectroscopy (XPS) to the practical concepts in this field. The book first introduces the reader to the language and concepts used in this field and then demonstrates how these concepts are applied. Including how the spectra are produced, factors that can influence the spectra (all initial and final state effects are discussed), how to derive speciation, volume analysed and how one controls this (includes depth profiling), and quantification along with background substraction and curve fitting methodologies.This is presented in a concise yet comprehensive manner and each section is prepared such that they can be read independently of each other, and all equations are presented using the most commonly used units. Greater emphasis has been placed on spectral understanding/interpretation. For completeness sake, a description of commonly used instrumentation is also presented. Finally, some complementary surface analytical techniques and associated concepts are reviewed for comparative purposes in stand-alone appendix sections. Zusammenfassung This book introduces readers interested in the field of X-ray Photoelectron Spectroscopy (XPS) to the practical concepts in this field. The book first introduces the reader to the language and concepts used in this field and then demonstrates how these concepts are applied. Including how the spectra are produced, factors that can influence the spectra (all initial and final state effects are discussed), how to derive speciation, volume analysed and how one controls this (includes depth profiling), and quantification along with background substraction and curve fitting methodologies.This is presented in a concise yet comprehensive manner and each section is prepared such that they can be read independently of each other, and all equations are presented using the most commonly used units. Greater emphasis has been placed on spectral understanding/interpretation. For completeness sake, a description of commonly used instrumentation is also presented. Finally, some complementary surface analytical techniques and associated concepts are reviewed for comparative purposes in stand-alone appendix sections. Inhaltsverzeichnis Foreword xi Preface xiii Acknowledgments xv List of Constants xvii 1 Introduction 1 1.1 Surface Analysis 1 1.2 XPSESCA for Surface Analysis 5 1.3 Historical Perspective 6 1.4 Physical Basis of XPS 7 1.5 Sensitivity and Specificity of XPS 10 1.6 Summary 11 2 Atoms, Ions, and Their Electronic Structure 13 2.1 Atoms, Ions, and Matter 13 2.1.1 Atomic Structure 14 2.1.2 Electronic Structure 15 2.1.2.1 Quantum Numbers 16 2.1.2.2 Stationary-State Notation 18 2.1.2.3 Stationary-State Transition Notation 20 2.1.2.4 Stationary States 21 2.1.2.5 Spin Orbit Splitting 23 2.2 Summary 25 3 XPS Instrumentation 27 3.1 Prerequisites of X-ray Photoelectron Spectroscopy (XPS) 27 3.1.1 Vacuum 28 3.1.1.1 Vacuum Systems 32 3.1.2 X-ray Sources 35 3.1.2.1 Standard Sources 37 3.1.2.2 Monochromated Sources 39 3.1.2.3 Gas Discharge Lamps 41 3.1.2.4 Synchrotron Sources 41 3.1.3 Electron Sources 42 3.1.3.1 Thermionic Sources 42 3.1.4 Ion Sources 43 3.1.4.1 EI Sources 43 3.1.5 Energy Analyzers 44 3.1.5.1 CMA 46 3.1.5.2 CHA 46 3.1.5.3 Modes of Operation 47 3.1.5.4 Energy Resolution 48 3.1.6 Detectors 49...
