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Silicon, the leading material in microelectronics during the last four decades, also promises to be the key material in the future. Despite many claims that silicon technology has reached fundamental limits, the performance of silicon microelectronics continues to improve steadily. The same holds for almost all the applications for which Si was considered to be unsuitable. The main exception to this positive trend is the silicon laser, which has not been demonstrated to date. The main reason for this comes from a fundamental limitation related to the indirect nature of the Si band-gap. In the recent past, many different approaches have been taken to achieve this goal: dislocated silicon, extremely pure silicon, silicon nanocrystals, porous silicon, Er doped Si-Ge, SiGe alloys and multiquantum wells, SiGe quantum dots, SiGe quantum cascade structures, shallow impurity centers in silicon and Er doped silicon. All of these are abundantly illustrated in the present book.
Info autore
Lorenzo Pavesi is Professor of experimental physics at the university of Trento (Italy). Born the 21st of november 1961, he received his master degree in physics in 1985 at the university of trento and the phd in physics in 1990 at the ecole polytechnique federale of lausanne (switzerland). in 1990 he became assistant professor, an associate professor in 1999 and full professor in 2002 at the university of trento. He organized several international conferences, workshops and schools and is a frequent invited speaker. He manages several research projects, both national and european.
Sergey V. Gaponenko is Head of the Laboratory for Nano-optics at the Stepanov Institute of Physics, National Academy of Sciences of Belarus. He is also Chairman of the Association of Lasers and Optics and Vice-president of the Laser Association.
Riassunto
Silicon, the leading material in microelectronics during the last four decades, also promises to be the key material in the future. Despite many claims that silicon technology has reached fundamental limits, the performance of silicon microelectronics continues to improve steadily. The same holds for almost all the applications for which Si was considered to be unsuitable. The main exception to this positive trend is the silicon laser, which has not been demonstrated to date. The main reason for this comes from a fundamental limitation related to the indirect nature of the Si band-gap. In the recent past, many different approaches have been taken to achieve this goal: dislocated silicon, extremely pure silicon, silicon nanocrystals, porous silicon, Er doped Si-Ge, SiGe alloys and multiquantum wells, SiGe quantum dots, SiGe quantum cascade structures, shallow impurity centers in silicon and Er doped silicon. All of these are abundantly illustrated in the present book.
