Process Technology for Semiconductor Lasers Crystal Growth and Microprocesses

Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. A review is given of the history of semiconductor-laser development and applications and of the materials used in lasing at short to long wavelengths. The basic design principles for semiconductor-laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies. The characterizations of laser materials and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter.

Product details

• Authors: Kenichi Iga, Susumu Kinoshita, Kenich Iga
• Publisher: Springer, Berlin
• Content: Book
• Product form: Paperback / Softback
• Publication date: 05.12.2012
• Subject: Natural sciences, medicine, IT, technology > Physics, astronomy > Electricity, magnetism, optics
• EAN: 9783642795787
• ISBN: 978-3-642-79578-7
• Pages: 169
• Illustrations: X, 169 p.
• Dimensions (packing): 15.5 x 23.5 cm
• Series: Springer Series in Materials Science > .30; Springer Series in Materials Science > 30
• Subjects: Design, Elektronik, Laser, History, Technology, Ingenieurswesen, Maschinenbau allgemein, Quantenphysik (Quantenmechanik und Quantenfeldtheorie), Development, Materialwissenschaft, Laserphysik, Production, Semiconductor, Micro-processes, SemiconductorLasers, epitaxialcrystalgrowth, SurfaceEmittingLasers