Fr. 189.00

Nanoimprint Lithography: An Enabling Process for Nanofabrication

Inglese · Copertina rigida

Spedizione di solito entro 6 a 7 settimane

Descrizione

Ulteriori informazioni

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application.
This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology.
Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

Sommario

Principles and statues of nanoimprint lithography.- Stamp Fabrication.- stamp surface treatment.- Nanoimprint lithography resists.- Nanoimprint lithography process.- Modeling and Simulation of NIL.- Application of NIL in Light emitting Diodes.- Application of NIL in memory devices.- Application of NIL in solar cell.

Info autore

Weimin Zhou Received a Ph.D. degree in Microelectronics and Solid-State Electronics from Shanghai Jiao Tong University, China. He is currently a Professor of Nanomaterials and Nanoelectronics in Shanghai Nanotechnology Promotion Center. His research interests cover semiconductor nanomaterials (nanowires, carbon-based, phase change material), novel semiconductor or nano devices, and nanofabrication, and lithium ion battery, etc. He has authored or coauthored more than 30 papers in scientific journals and is the holder of four patents in the micro/nano electronics area and material Engineering. Some research achievement is highlighted by Nature Nanotechnlogy magazine. He is also a reviewer for many scientific magazines, such as Appl. Phys. Lett, Nanotechnolgoy.

Riassunto

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application.
This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology.
Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

Dettagli sul prodotto

Autori Weimin Zhou
Editore Springer, Berlin
 
Lingue Inglese
Formato Copertina rigida
Pubblicazione 01.01.2013
 
EAN 9783642344275
ISBN 978-3-642-34427-5
Pagine 249
Dimensioni 173 mm x 243 mm x 16 mm
Peso 530 g
Illustrazioni XIII, 249 p.
Categorie Scienze naturali, medicina, informatica, tecnica > Tecnica > Tematiche generali, enciclopedie

B, Nanowissenschaften, engineering, Optical and Electronic Materials, Nanotechnology, Nanochemistry, Electronic materials, Electronic devices & materials, Optical Materials, Microsystems and MEMS, Nanotechnology and Microengineering

Recensioni dei clienti

Per questo articolo non c'è ancora nessuna recensione. Scrivi la prima recensione e aiuta gli altri utenti a scegliere.

Scrivi una recensione

Top o flop? Scrivi la tua recensione.

Per i messaggi a CeDe.ch si prega di utilizzare il modulo di contatto.

I campi contrassegnati da * sono obbligatori.

Inviando questo modulo si accetta la nostra dichiarazione protezione dati.